Why is tetrafluoromethane used for dry etching?

Dry etching is usually used for small geometry devices to have more control in shaping the vertical walls. Tetrafluoromethane (CF4) is one of the reactive ions created from chemical dry etching.

Is tetrafluoromethane stable?

Tetrafluoromethane is very stable due to the strength of C-F bonds with bonding energy of 515 kJ.mol-1. Therefore it is inert to acids and hydroxides influence; however, it reacts explosively with alkali metals. Thermal decomposition produces very toxic gases (carbonyl fluoride, carbon monoxide, and in the presence of water also, corrosive hydrogen fluoride).

What does the Microelectronics industry use Tetrafluoromethane Gas for?

Tetrafluoromethane can be widely used in silicon, silica, silicon, phosphorus silicon nitride thin film material such as glass and tungsten etching, in electronic components surface cleaning, solar cell production, laser technology, cryogenic refrigeration, leak test, and more.

What are the common uses of Tetrafluoromethane?

Tetrafluoromethane is sometimes used as a low-temperature refrigerant. It is used in circuit board manufacture and manufacture of insulating materials and semiconductors. It is used as a gas etchant and dry/plasma etching.

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