Trimethylsilane
Trimethylsilane
Formula: C3H10Si
Trimethylsilane (Si(CH3)3H) is a volatile organosilicon compound used in semiconductor processing and chemical synthesis. It serves as a precursor for silicon-containing films and surface treatments, offering controlled reactivity and deposition characteristics.
In semiconductor applications, trimethylsilane is used in plasma-enhanced chemical vapor deposition (PECVD) and surface modification processes. Its chemistry supports the formation of silicon-based and carbon-containing films with tailored properties.
Applications include:
- Used as a precursor in PECVD processes for silicon-containing films.
- Enables deposition of silicon-carbon and related materials.
- Applied in surface modification and passivation processes.
- Used in chemical synthesis and organosilicon chemistry.
- Supports advanced materials and research applications.
EFC Gases & Advanced Materials supplies high-purity TMS gas with tight control of moisture and critical impurities to ensure consistent performance in demanding applications.
Applications
Specifications
- Deposit silicon-containing films via PECVD.
- Form silicon-carbon materials.
- Modify and passivate surfaces.
- Support organosilicon synthesis.
- Enable advanced materials research.
| Grade 3 | Grade 4 | Grade 5 | |
|---|---|---|---|
| Purity | 99.9% | 99.99% | 99.999% |
Moisture level guaranteed only when EFC Gases & Advanced Materials prepares the cylinders.
All concentrations are on a mol/mol basis unless otherwise stated. Product sold on the basis of total impurities. Individual impurities may vary slightly.
