Silicon Tetrafluoride (SiF4)
Silicon Tetrafluoride (SiF4) is a colorless, corrosive, non-flammable, toxic gas.
Silicon Tetrafluoride
Formula: SiF4
CAS No: 7783-61-1
Silicon Tetrafluoride (SiF4) is a colorless, toxic, and corrosive gas used in semiconductor manufacturing and chemical processing. It is a key fluorine-containing silicon compound that reacts readily with moisture to form hydrofluoric acid and silica, making it both highly reactive and useful in controlled environments.
In semiconductor applications, silicon tetrafluoride is used in plasma etching and deposition processes, where it contributes to the formation and removal of silicon-containing layers. Its behavior in fluorine-based plasma systems enables precise material modification and surface control.
Applications include:
- Used in plasma etching of silicon, silicon dioxide, and related semiconductor materials.
- Applied in deposition processes involving silicon-containing films.
- Serves as an intermediate in the production of high-purity silicon and fluorosilicates.
- Used in glass etching and surface treatment applications.
- Applied in chemical synthesis and specialty fluorination processes.
Material Compatibility
Silicon tetrafluoride reacts readily with moisture to form hydrofluoric acid and solid silica, which can corrode materials and obstruct system components. Moisture control and selection of compatible metals and fluoropolymers are critical to prevent corrosion and maintain system reliability.
EFC Gases & Advanced Materials supplies high-purity silicon tetrafluoride with tight control of moisture and critical impurities to ensure consistent performance in demanding applications.
Applications
Specifications
Further Specifications
Cylinder Sizes
- Etch silicon, SiO₂, and related materials.
- Deposit silicon-containing films.
- Produce high-purity silicon intermediates.
- Etch and treat glass surfaces.
- Support fluorination and chemical processing.
| Grade 4 | |
|---|---|
| Purity | 99.99% |
| Nitrogen | < 3 ppmv |
| Oxygen + Argon | < 1 ppmv |
| Carbon Dioxide | < 1 ppmv |
| Carbon Monoxide | < 0.5 ppmv |
| Methane | < 10 ppmv |
| Hydrogen Fluoride | < 50 ppmv |
| Arsenic | < 0.5 ppmv |
| Boron | < 0.5 ppmv |
| Phosphorus | < 0.5 ppmv |
| Chemical & Physical Properties | |
|---|---|
| Molecular Weight | 104.8 |
| Specific Volume | 3.7 cu. ft/lb |
| Pressure @ 70°F | 1000 psig |
| Valve Outlet | CGA 330 DISS 642 |
| Shipping Information | |
|---|---|
| DOT Name | Silicon Tetrafluoride |
| Hazard Class | 2.3 |
| DOT No. | UN 1859 |
| DOT Label | Poison Gas, Corrosive |
| CAS No. | 7783-61-1 |
| Cylinder Size | Fill Weight (lb) |
|---|---|
| 44L/Size 200 | 80 |
Moisture level guaranteed only when EFC Gases & Advanced Materials prepares the cylinders.
All concentrations are on a mol/mol basis unless otherwise stated. Product sold on the basis of total impurities. Individual impurities may vary slightly.
*RFO available
